|
UV
(Ultraviolet)
Laser |
| |
|
266 nm DUV Solid State
Laser |
|
|
CNI’s self-developed
266 nm
all-solid-state
deep-UV lasers
include CW and
pulsed series,
featuring low noise,
high stability,
narrow linewidth,
excellent beam
quality and
long-term reliable
operation.
The 266 nm CW
deep-UV laser
features
spectral
linewidth
<
0.2 nm, power
stability
<
0.5%, and
maximum output
power up to 1.5
W. The 266 nm
pulsed deep-UV
laser provides
single-pulse
energy up to 5
mJ and pulse
width
<
10 ps.
Supporting air
or water
cooling, they
ensure stable
24/7 operation
and are
compatible with
OEM integration
as well as
internal and
external
triggering.
They are widely
used in spectral
analysis,
bio-fluorescence
detection,
semiconductor
inspection,
scientific
research and
precision
measurement.
|
|
|
|
Features
CW
Output
Power Up to
1.5 W
Power
Stability < 0.5%
Peak Power
Up to
500 kW
Single Pulse Energy
Up to
5 mJ
CW/ Pulsed
|
Applications
Wafer / Chip Defect Inspection
Fluorescence Spectroscopy
Excitation
Photoacoustic Imaging
LIBS
Precision Micromachining
Atomic / Molecular Physics
Experiments
Cold Atom Manipulation |
 |
|
|
Specifications |
| |
|
266 nm High Stability
DUV
CW Laser |
|
Model |
Output
Power
(mW) |
Spectral Linewidth
(nm) |
Power Stability
(rms, 4 Hours±3℃) |
Features
|
|
UV-DP-266-B |
1~1500 |
<0.2 |
<0.5% |
Water cooled |
|
| |
|
266 nm
Passively
Q-switched DUV Laser |
|
Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ns) |
|
MPL-Q-266 |
1~30 |
0.1~3 µJ |
3-12
kHz |
~1.3 |
|
MPL-Q1-266 |
10 |
10 µJ |
1
kHz |
~1 |
|
MPL-FN-266 |
1~15 |
1~8 µJ |
10 Hz-3 kHz |
~0.6 |
|
MPL-S-266-LP |
1~15 |
1~15 µJ |
1 Hz-1 kHz |
~0.4 |
|
MPL-S-266-HP |
6~100 |
1~80 µJ |
10 Hz-100 kHz |
~0.4 |
|
|
|
|
266 nm Actively Q-switched DUV Laser |
|
Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ns) |
|
AO-S-266 |
1~10 |
1~5 µJ |
1Hz-5kHz |
~4 |
|
AO-S-266-H |
1~20 |
1~20 µJ |
1 Hz-1 kHz |
~9 |
|
AO-Mini-E-266 |
1~30 |
1~12 µJ |
1 Hz-10 kHz |
~8@2.5
kHz |
|
AO-266A |
100~200 |
4~7 µJ |
20-200 kHz |
~10@30
kHz |
|
AO-U-266 |
200~400 |
60~80 µJ |
1-10 kHz |
~15@3
kHz |
|
AO-266W |
500~2000 |
10-15 µJ |
50-200 kHz |
~10@50
kHz |
|
AO-U-532& 266 |
1~3W &
200~400 |
500~1000 µJ &
60~80 µJ |
1-10 kHz |
~10@3
kHz |
|
EO-S-266-RS |
1~50 |
1~40 µJ |
10 Hz-10 kHz |
~1.3 |
|
EO-266W |
3000 |
60 µJ |
10-100 kHz |
<5 |
|
EO-266-G |
100~2500 |
4~100
µJ |
1 Hz-25 kHz |
<9@1
kHz |
|
EO-266-Subnano |
1~100 |
1~100 µJ |
1-5 kHz |
<2ns@1
kHz |
|
EO-266-N |
100~3700 |
4~150
µJ |
1 Hz-25 kHz |
<5@1 kHz |
|
EO-266-P-Subnano |
2~220 |
1~110 µJ |
500 Hz-2 kHz
(optional) |
<1 |
|
EO-266-Subnano-Hi |
1~2.5 W |
1~500 uJ |
100 Hz-10 kHz |
<1.5
ns@5
KHz
～2ns@5 kHz |
|
DPS-266-Neoma |
100-300 |
1~3
mJ |
1-100 Hz
(Adjustable) |
<12 |
|
DPS-266-Q |
200-500 |
2~5 mJ |
1-100 Hz
(Adjustable) |
<10 |
|
|
|
|
266
nm Picosecond Pulsed DUV Laser |
|
Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ps) |
|
DPS-266-Pico |
100~500 |
10~100 nJ
|
5 MHz |
<50, 50-900 |
|
PS-D-266-Air |
1~100 |
1~12 µJ |
1 kHz-10 MHz |
~10 |
|
PS-D-266 |
1~5 W
|
0.1~4 µj
|
400 kHz-1 MHz |
~10 |
|
| |
|
266
nm Fiber Laser |
|
Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ps) |
|
FL-266-PS |
1~10 |
0.02~0.5 nJ |
20-50 MHz |
<10 |
|
FL-266-Pico |
1~50 |
0.05~500 nJ |
100 kHz-20 MHz |
50-900 (fixed) |
|
FL-266-Nano |
1~50 |
1~500nJ |
100 kHz-1 MHz |
0.5-50
ns
(fixed) |
|
| |
|
|
Measurement
Data |
 |
 |
|
Central Wavelength: 266.955nm
@ UV-DP-266-B |
Output Power:
222.5 mW @ UV-DP-266-B |
|
Linewidth: 9.4 pm @ UV-DP-266-B |
Power Stability <1% @
UV-DP-266-B |
|
|
