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UV
(Ultraviolet)
Laser |
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355 nm UV CW Solid State
Laser |
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CNI’s self-developed 355 nm UV laser series includes CW,
actively & passively Q-switched, nanosecond and picosecond models,ideal for
precision machining and cutting-edge scientific research.
Tt features low noise, high stability, ultra-narrow linewidth and excellent
beam quality, with 355 nm CW lasers delivering up to 5 W output power,
linewidth <1
MHz and power stability <0.5%,
and pulsed lasers offering single pulse energy up to 200 mJ and pulse width
<10 ps.
Supporting air or water cooling, they enable stable 24/7 operation with
internal and external modulation control, and are fully compatible with OEM
integration. Compact in structure and long in service life, these lasers are
widely used in wafer dicing, glass drilling, ceramic cutting, semiconductor
inspection, wafer defect detection, biological imaging, quantum research,
Raman spectroscopy and other fields.
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Features
Linewidth
<
1 MHz
Noise of Amplitude
<
0.5%
CW
Output
Power Up to
5
W
Power
Stability < 1%
CW/ Pulsed
Single Pulse Energy
>200mJ
Pulse
Width < 10 ps |
Applications
Raman Spectroscopy
Wafer Dicing & Semiconductor
Inspection
Glass Drilling & Ceramic Cutting
Wafer Defect Detection
Biological Imaging
Quantum Research
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Specifications |
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355
nm Single Longitudinal Mode UV Laser |
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Model |
Central Wavelength(nm) |
Output
Power
(mW) |
Operating Mode |
Spectral Linewidth(MHz) |
Power Stability
(rms, 4 Hours±3℃) |
Noise of Amplitude |
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MSL-FN-355 |
355±1 |
1~10mW |
CW |
<1 |
<2% |
<0.5% |
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MSL-R-355 |
355±1 |
10~100mW |
CW |
<5 |
<1% |
<0.5% |
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355
nm
Low Noise UV Laser |
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Model |
Central Wavelength(nm) |
Output
Power
(mW) |
Operating Mode |
Spectral Linewidth(MHz) |
Power Stability
(rms, 4 Hours±3℃) |
Noise of Amplitude |
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UV-FN-355-LN |
355±1 |
1~10mW |
CW |
<0.003 |
<2% |
<1% |
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MLL-A-355 |
355±1 |
10~50mW |
CW |
<0.003 |
<1% |
<1% |
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355 nm High Stability
CW UV Laser |
|
Model |
Central Wavelength(nm) |
Output
Power
(mW) |
Operating Mode |
Spectral Linewidth(nm) |
Power Stability
(rms, 4 Hours±3℃) |
Features
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UV-FN-355 |
355±1 |
1~50mW |
CW |
< 0.2 |
<2% |
TEM00 |
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UV-A-355 |
355±1 |
50~450mW |
CW |
<0.2 |
<1% |
TEM00 |
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UV-B-355 |
355±1 |
100~1000mW |
CW |
<0.04 |
<1% |
TEM00 |
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UV-C-355 |
355±1 |
1~2W |
CW |
<0.04 |
<1% |
TEM00 |
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UV-D-355 |
355±1 |
2~5W |
CW |
<0.08 |
<1% |
Water cooled |
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UV-FN-355-SM |
355±1 |
1~20mW |
CW |
<0.2 |
<3% |
TEM00 |
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355
nm
Passively Q-switched UV Laser |
|
Model |
Central Wavelength(nm) |
Single Pulse Energy/
Average power (mW) |
Operating mode
(Q-switched) |
Repetition Rate |
Power
Stability
(rms, 4 Hours±3℃) |
Pulse
Width
(ns) |
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MPL-FN-355 |
355±1 |
1~15uJ/
1~30mW |
Passively |
10 Hz-3 kHz |
<2% |
~0.6 |
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MPL-F-355 |
355±1 |
0.1~15uJ/
1~100mW |
Passively |
1-7 kHz |
<2% |
~5 |
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MPL-Q-355 |
355±1 |
0.1~15uJ/ 1~150mW |
Passively |
3-12
kHz |
<3% |
~1.3 |
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MPL-S-355-LP |
355±1 |
1~30uJ/ 1~30mW |
Passively |
1 Hz-1 kHz |
<2% |
~0.4 |
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FL-355 |
355±1 |
1~50uJ/ 1~1000mW |
Passively |
~20 kHz |
<1% |
~3 |
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Mini-E-PA-355 |
355±1 |
40uJ/
1000mW |
Passively |
~20
kHz |
<1% |
~4 |
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MPL-FL-355 |
355±1 |
1~50uJ/ 1~1000mW |
Passively |
~20
kHz |
<1% |
~5 |
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MPL-S-355-HP |
355±1 |
1~120uJ/ 1~120mW |
Passively |
1 Hz-100 kHz |
<3% |
~0.4 |
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355
nm Actively Q-switched UV Laser |
|
Model |
Central Wavelength(nm) |
Single Pulse Energy/
Average power (mW) |
Operating mode
(Q-switched) |
Repetition Rate |
Power
Stability
(rms, 4 Hours±3℃) |
Pulse
Width
(ns) |
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AO-S-355 |
355±1 |
1~40uJ/ 1~100mW |
Actively |
1 Hz-20 kHz |
<3% |
5-10@<10 kHz |
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AO-Mini-E-355 |
355±1 |
1~200uJ/ 1~1000mW |
Actively |
1 Hz-10 kHz
10-100 k Hz |
<1% |
~9@1Hz-1kHz
~20@10 kHz
~8@50 kHz |
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AO-V-355 |
355±1 |
1mJ/
1W/ 3W/ 5W |
Actively |
1Hz-10kHz
20-200kHz |
<1% |
~12@1 kHz
~15@5 kHz
~12@30 kHz
~15@30 kHz |
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AO-355A |
355±1 |
1mJ/
1W/ 3W/ 5W |
Actively |
1 Hz-10 kHz
20-200 kHz |
<1% |
~12@1 kHz
~15@5 kHz
~12@30 kHz
~15@30 kHz |
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AO-355W |
355±1 |
1mJ/ 5W |
Actively |
1 Hz-10 kHz
20-200 kHz |
<1% |
~15@5 kHz/ 30kHz |
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AO-355W |
355±1 |
1W/ 3W/
12W
20W
25W/ 40W/
60W |
Actively |
1-10 kHz
20-200 kHz
50-200 kHz |
<1% |
~11@50 kHz |
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AO-532A&
355A |
355±1 |
500uJ/ 1W
&
500uJ/ 1W |
Actively |
1-10 kHz |
<1% |
~13@1 kHz
~13@2 kHz
~19@5 kHz |
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EO-S-355-L |
355±1 |
1~10uJ/ 1~10mW |
Actively |
10 Hz-1 kHz |
<3% |
~5 |
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EO-355-PS |
355±1 |
1~6W |
Actively |
1-1000 kHz |
<5% |
<15 ps |
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EO-355-Subnano |
355±1 |
1~50uJ/ 1~100mW |
Actively |
1-5 kHz(adjustable) |
<3% |
<1.5@1 kHz |
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EO-XS-355 |
355±1 |
1~50uJ/
1~2W |
Actively |
1-100 kHz |
<3% |
~4@40 kHz |
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EO-S-355-RS |
355±1 |
1~70uJ/
1~150mW |
Actively |
10Hz-1kHz
1-20kHz |
<3% |
~1.3 |
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EO-355-P-Subnano |
355±1 |
1~130uJ |
Actively |
500 Hz,1 kHz,2 kHz(optional) |
<5% |
<1 |
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EO-355-G |
355±1 |
4~150uJ |
Actively |
1 Hz-25 kHz |
<3% |
<6@1 kHz
<6@5 kHz |
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EO-355-N |
355±1 |
4~200uJ |
Actively |
1 Hz-25 kHz |
<3% |
<6@1 kHz
<6@5 kHz |
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EO-355-Subnano-Hi |
355±1 |
1~600uJ/ 1~3W |
Actively |
100 Hz-10 kHz |
<5% |
<1.5@5 kHz |
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DPS-355-E |
355±1 |
1~2mJ |
Actively |
1-50 Hz
(optional) |
<5% |
<4 |
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DPS-355-Neoma |
355±1 |
1~4mJ |
Actively |
1-100 Hz
(adjustable) |
<2% |
<12 |
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DPS-355-Q |
355±1 |
1~10mJ |
Actively |
1-100 Hz
(adjustable) |
<3% |
<10 |
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355
nm
Lamp Pumped Q-switched Laser |
|
Model |
Central Wavelength(nm) |
Single Pulse Energy/
Average power (mW) |
Operating mode
(Q-switched) |
Repetition Rate |
Power
Stability
(rms, 4 Hours±3℃) |
Pulse
Width
(ns) |
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LPS-355-S |
355±1 |
20~80mJ |
Actively |
1-10 Hz
(adjustable) |
<3% |
<10 |
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LPS-355-L |
355±1 |
80~200mJ |
Actively |
1-10 Hz
(adjustable) |
<3% |
<10 |
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LPS-355-Q |
355±1 |
80~200mJ
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Actively |
1-10 Hz
(adjustable) |
<3% |
<10 |
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355
nm
Picosecond Pulsed UV Laser |
|
Model |
Central Wavelength(nm) |
Single Pulse Energy/
Average power (mW) |
Operating mode
(Q-switched) |
Repetition Rate |
Power
Stability
(rms, 4 Hours±3℃) |
Pulse
Width
(ps) |
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DPS-355-Pico |
355±1 |
100~700mW |
Pulsed |
5 MHz |
<3% |
<50 |
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PS-D-532
&
355-Air |
355±1 |
1~500mW |
Pulsed |
0.1-1 MHz |
<1% |
~10 |
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PS-D-355-Air |
355±1 |
1~1000mW |
Pulsed |
1 kHz-10 MHz |
<1% |
~10 |
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PS-D-355-Water |
355±1 |
1~2000mW |
Pulsed |
0.4-2 MHz |
<1% |
~10 |
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PS-D-355 |
355±1 |
1~30W |
Pulsed |
0.4-1 MHz
80 MHz±1
120 MHz±1 |
<1% |
~10 |
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355
nm
Fiber Laser |
|
Model |
Central Wavelength(nm) |
Single Pulse Energy/
Average power (mW) |
Operating mode
(Q-switched) |
Repetition Rate |
Power
Stability
(rms, 4 Hours±3℃) |
Pulse
Width
(ns) |
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FL-355-PS |
355±1 |
1~50mW |
Passively |
20-50 MHz |
<3% |
<10 |
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FL-355-Pico |
355±1 |
1~50mW |
Pulsed |
0.1-20 MHz |
<3% |
100-900 |
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FL-355-Nano |
355±1 |
10~300mW |
pulsed |
0.1-1 MHz |
<3% |
0.5-50 ns |
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355
nm
Fiber Coupled Laser System |
|
Model |
Central Wavelength(nm) |
Output
Power
(mW) |
Operating Mode |
Spectral Linewidth(nm) |
Power Stability
(rms, 4 Hours±3℃) |
Features
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MPL-355 (FC) |
355±1 |
1~1500mW |
CW |
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<1% |
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Flatness:
λ/5
Surface Quality: Class I
Clear Aperture:18mm
×
10mm
Transmission: R>99.5%,
λ=266-355nm,
Brewster angle of incidence
Coating: Without coating
Angle of incidence: 57+/-1° |
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Beam Splitting Principle |
UV-Grade Fused Silica Prism |
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Measurement
Data |
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Central Wavelength: 354.707nm
@ UV-A-355 |
Output Power:
336.9 mW @
UV-A-355 |
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Linewidth: 13.2 pm
@
UV-A-355 |
Power
Stability
<1%
@ UV-A-355 |
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