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UV
(Ultraviolet)
Laser |
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355 nm CW UV Laser |
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CNI independently develops and manufactures a full series of
355nm UV lasers, including continuous-wave (CW) and pulsed UV lasers such as
single-frequency CW, low-noise CW, high-stability CW, actively/passively
Q-switched pulsed, and picosecond pulsed models, suitable for diverse
industrial processing and scientific research applications.
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Features
Linewidth
<
1 MHz
RMS Noise
< 0.5%
CW
Output
Power Up to
5
W
Power
Stability < 1% |
Applications
Raman Spectroscopy
Biological Imaging
Quantum Research
Interferometry |
MSL-FN-355 |
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Specifications |
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355
nm Single Longitudinal Mode UV CW
Laser |
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Model |
Output
Power
(mW) |
Spectral Linewidth(MHz) |
Power Stability
(rms, 4 Hours±3℃) |
Noise
(rms, 20Hz-20MHz) |
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MSL-FN-355 |
1~10 mW |
<1 |
<2% |
<0.5% |
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MSL-R-355 |
10~100 mW |
<5 |
<1% |
<0.5% |
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355
nm
Low Noise
UV
CW Laser |
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Model |
Output
Power
(mW) |
Spectral Linewidth
(nm) |
Power Stability
(rms, 4 Hours±3℃) |
Noise
(rms, 20Hz-20MHz) |
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UV-FN-355-LN |
1~10 mW |
<0.003 |
<2% |
<1% |
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MLL-A-355 |
10~50 mW |
<0.003 |
<1% |
<1% |
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355 nm High Stability
UV CW Laser |
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Model |
Output
Power
(mW) |
Spectral Linewidth
(nm) |
Power Stability
(rms, 4 Hours±3℃) |
Features
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UV-FN-355 |
1~50 mW |
< 0.2 |
<2% |
TEM00 |
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UV-A-355 |
50~450 mW |
<0.2 |
<1% |
TEM00 |
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UV-B-355 |
100~1000 mW |
<0.04 |
<1% |
TEM00 |
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UV-C-355 |
1~2 W |
<0.04 |
<1% |
TEM00 |
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UV-D-355 |
2~5 W |
<0.08 |
<1% |
Water cooled |
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UV-FN-355-SM |
1~20 mW |
<0.2 |
<3% |
TEM00 |
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355 nm Pulsed UV Laser |
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Features
Single Pulse Energy Up to 200mJ
Output
Power
Up to 60W
Pulse Width < 10 ps
Internal & External Triggering
Ultra-robust, Proven Reliability
Hermetically Sealed Packages |
Applications
Semiconductor Processing
Wafer Inspection
Drilling and Cutting of Glass /
Ceramics
Laser Marking and Scribing
OLED / LCD Repair
LIBS |
AO-Mini-E-355 |
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Specifications |
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355
nm
Passively Q-switched UV Laser |
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Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ns) |
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MPL-FN-355 |
1~30 |
1~15 µJ |
10 Hz-3 kHz |
~0.6 |
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MPL-F-355 |
1~100 |
0.1~15
µJ |
1-7 kHz |
~5 |
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MPL-Q-355 |
1~150 |
0.1~15 µJ |
3-12
kHz |
~1.3 |
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MPL-S-355-LP |
1~30 |
1~30 µJ |
1 Hz-1 kHz |
~0.4 |
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FL-355 |
1~1000 |
1~50 µJ |
~20 kHz |
~3 |
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Mini-E-PA-355 |
1000 |
40
µJ |
~20
kHz |
~4 |
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MPL-FL-355 |
1~1000 |
1~50 µJ |
~20
kHz |
~5 |
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MPL-S-355-HP |
1~120 |
1~120 µJ |
1 Hz-100 kHz |
~0.4 |
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355
nm Actively Q-switched UV Laser |
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Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ns) |
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AO-S-355 |
1~100 |
1~40 µJ |
1 Hz-20 kHz |
5-10@<10 kHz |
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AO-Mini-E-355 |
1~1000 |
1~200 µJ |
1 Hz-100 kHz |
~9@1Hz-1kHz |
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AO-V-355 |
1W/ 3W/ 5W |
1 mJ |
1 Hz-200 kHz |
~12@1 kHz |
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AO-355A |
1W/ 3W/ 5W |
1 mJ |
1 Hz-200 kHz |
~12@1 kHz |
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AO-355W |
5W |
1 mJ |
1 Hz-200 kHz |
~15@5 kHz |
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AO-355W |
1W/ 3W/ 12W
20W
25W/
40W/ 60W |
1 mJ/ 600
µJ/
200 µJ
400 µJ
400 µJ/
600 µJ/
1 mJ |
1-2000 kHz |
~11@50 kHz |
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AO-532A&
355A |
1 W& 1 W |
500 µJ
&
500 µJ |
1-10 kHz |
~13@1 kHz |
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EO-S-355-L |
1~10 |
1~10 µJ |
10 Hz-1 kHz |
~5 |
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EO-355-PS |
1~6 W |
1~40
µJ |
1-1000 kHz |
<15 ps |
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EO-355-Subnano |
1~100 |
1~50
µJ |
1-5 kHz(adjustable) |
<1.5@1 kHz |
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EO-XS-355 |
1~2 W |
1~50 µJ |
1-100 kHz |
~4@40 kHz |
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EO-S-355-RS |
1~150 |
1~70 µJ |
10 Hz-20 kHz |
~1.3 |
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EO-355-P-Subnano |
1~260 |
1~130 µJ |
500 Hz-2 kHz(optional) |
<1 |
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EO-355-G |
4~750 |
4~150 µJ |
1 Hz-25 kHz |
<6@1 kHz |
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EO-355-N |
12~600 |
4~200 µJ |
1 Hz-25 kHz |
<6@1 kHz |
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EO-355-Subnano-Hi |
1~3 W |
1~600 µJ |
100 Hz-10 kHz |
<1.5@5 kHz |
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DPS-355-E |
50-100 |
1~2 mJ |
1-50 Hz
(optional) |
<4 |
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DPS-355-Neoma |
100-400 |
1~4 mJ |
1-100 Hz
(adjustable) |
<12 |
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DPS-355-Q |
100-1000 |
1~10 mJ |
1-100 Hz
(adjustable) |
<10 |
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355
nm
Lamp Pumped Q-switched UV Laser |
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Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ns) |
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LPS-355-S |
200-800 |
20~80 mJ |
1-10 Hz
(adjustable) |
<10 |
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LPS-355-L |
800-2000 |
80~200 mJ |
1-10 Hz
(adjustable) |
<10 |
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LPS-355-Q |
800-2000 |
80~200 mJ
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1-10 Hz
(adjustable) |
<10 |
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355
nm
Picosecond Pulsed UV Laser |
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Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ps) |
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DPS-355-Pico |
100~700 |
20-140 nJ |
5 MHz |
<50 |
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PS-D-532
&
355-Air |
1~500 |
1~500 nJ |
0.1-1 MHz |
~10 |
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PS-D-355-Air |
1~1000 |
1~100 nJ |
1 kHz-10 MHz |
~10 |
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PS-D-355-Water |
1~2000 |
1~2000 nJ |
0.4-2 MHz |
~10 |
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PS-D-355 |
1~30 W |
1~30 µJ |
0.4-1 MHz |
~10 |
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355
nm
Fiber Laser |
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Model |
Average Power (mW) |
Single Pulse Energy |
Repetition Rate |
Pulse
Width
(ps) |
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FL-355-PS |
1~50 |
0.05~2.5
nJ |
20-50 MHz |
<10 |
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FL-355-Pico |
1~50 |
10~500 nJ |
0.1-20 MHz |
100-900 |
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FL-355-Nano |
10~300 |
0.1~3 µJ |
0.1-1 MHz |
0.5-50 ns |
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355
nm
Fiber Coupled Laser System |
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Model |
Output
Power (mW) |
Power Stability
(rms, 4 Hours±3℃) |
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MPL-355 (FC) |
1~1500mW |
<1% |
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Measurement
Data |
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Central Wavelength: 354.707nm
@ UV-A-355 |
Output Power: 336.9 mW @ UV-A-355 |
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Linewidth: 13.2 pm @ UV-A-355 |
Power Stability <1% @ UV-A-355 |
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Accessories |
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Flatness:
λ/5
Surface Quality: Class I
Clear Aperture:18mm × 10mm
Transmission: R>99.5%,
λ=266-355nm, Brewster
angle of incidence
Coating: Without coating
Angle of incidence: 57+/-1°
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Beam Splitting Principle |
UV-Grade Fused Silica Prism |
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